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Optical Microlithography XXVI: 26-28 February 2013, San Jose, California, United States

ISBN: 0819494658, 9780819494658
Author/Editor(s): Willard Conley; SPIE Digital Library; SPIE (Society); Inc Cymer
Publisher: SPIE ( Bellingham Wash )
Published/Copyright Year: 2013
Language: English
Series: Proceedings Of SPIE ( v. 8683 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 8683 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Optical Microlithography XXV: 13-16 February 2012, San Jose, California, United States

ISBN: 0819489824, 9780819489821
Author/Editor(s): Willard Conley; SPIE Digital Library; SPIE (Society); Inc Cymer
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2012
Language: English
Series: Proceedings Of SPIE ( v. 8326 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 8326 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Photomask And Next-generation Lithography Mask Technology XVIII: 13-15 April 2011

ISBN: 0819486736, 9780819486738
Author/Editor(s): Toshio Konishi; SPIE (Society); Photomask Japan; BACUS (Technical group)
Publisher: SPIE ( Bellingham )
Published/Copyright Year: 2011
Language: English
LCCN: 2012360841
Series: Proceedings Of SPIE ( v. 8081 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 8081 )
Categories:
Masks (Electronics) > Congresses
Integrated Circuits > Masks > Congresses
X-ray Lithography > Congresses
Microlithography > Congresses
Optoelectronic Devices > Design And Construction > Congresses

Optical Microlithography XXIV: 1-3 March 2011, San Jose, California, United States

ISBN: 0819485322, 9780819485328
Author/Editor(s): Mircea V Dusa; SPIE Digital Library; SPIE (Society); Inc Cymer
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2011
Language: English
Series: Proceedings Of SPIE ( v. 7973 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7973 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Photomask And Next-generation Lithography Mask Technology XVII: 13-15 April 2010, Yokohama, Japan

ISBN: 0819482382, 9780819482389
Author/Editor(s): Kunihiro Hosono; SPIE (Society); Photomask Japan
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2010
Language: English
LCCN: 2012419337
Series: Proceedings Of SPIE ( v. 7748 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7748 )
Categories:
Masks (Electronics) > Congresses
Integrated Circuits > Masks > Congresses
X-ray Lithography > Congresses
Microlithography > Congresses
Optoelectronic Devices > Design And Construction > Congresses

Optical Microlithography XXIII: 23-25 February 2010, San Jose, California, United States

ISBN: 0819480541, 9780819480545
Author/Editor(s): Mircea V Dusa; Willard Conley; SPIE (Society); SEMATECH (Organization)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2010
Language: English
LCCN: 2011293385
Series: Proceedings Of SPIE ( v. 7640 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7640 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Lithography Asia 2009: 18-19 November 2009, Taipei, Taiwan

ISBN: 0819479098, 9780819479099
Author/Editor(s): Alek C Chen; SPIE Digital Library; SPIE (Society)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2009
Language: English
Series: Proceedings Of SPIE ( v. 7520 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7520 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Photomask And Next-generation Lithography Mask Technology XVI: 8-10 April 2009, Yokohama, Japan

ISBN: 0819476560, 9780819476562
Author/Editor(s): Kunihiro Hosono; Photomask Japan; BACUS (Technical group); SPIE (Society)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2009
Language: English
LCCN: 2010287868
Series: Proceedings Of SPIE ( v. 7379 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7379 )
Categories:
Masks (Electronics) > Congresses
Integrated Circuits > Masks > Congresses
X-ray Lithography > Congresses
Microlithography > Congresses
Optoelectronic Devices > Design And Construction > Congresses

Optical Microlithography XXII: 24-27 February 2009, San Jose, California, United States

ISBN: 0819475270, 9780819475275
Author/Editor(s): Harry J Levinson; Mircea V Dusa; SPIE (Society); International SEMATECH
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2009
Language: English
LCCN: 2011499390
Series: Proceedings Of SPIE ( v. 7274 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7274 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan

ISBN: 0819473812, 9780819473813
Author/Editor(s): Alek C Chen; Burn Lin; Anthony Yen; SPIE (Society); Taiwan Semiconductor Industry Association
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2008
Language: English
LCCN: 2010287933
Series: Proceedings Of SPIE ( v. 7140 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses