30th European Mask And Lithography Conference 24 - 25 June 2014, Dresden, Germany

ISBN: 1628412852, 9781628412857
Author/Editor(s): Mikro- und Feinwerktechnik Gesellschaft Mikroelektronik; European Mask and Lithography Conference ; 30; Uwe F. W Behringer
Publisher: SPIE ( Bellingham, Wash )
Published/Copyright Year: 2014
Language: English
Number of pages: 260
Categories:
Halbleitertechnologie
Maske > Swd
Lithographie > Swd
Integrated Circuits
Microlithography

Metrology, Inspection, And Process Control For Microlithography XXV: 28 February-3 March 2011, San Jose, California, United States

ISBN: 0819485306, 9780819485304
Author/Editor(s): Christopher J Raymond; SPIE (Society); Nova Measuring Instruments Ltd
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2011
Language: English
LCCN: 2012360950
Series: Proceedings Of SPIE ( v. 7971 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7971 )
Categories:
Integrated Circuits > Inspection > Congresses
Integrated Circuits > Measurement > Congresses
Microlithography > Congresses
Process Control > Congresses

Photomask Technology 2011: 19-22 September 2011, Monterey, California, United States

ISBN: 0819487910, 9780819487919
Author/Editor(s): Wilhelm Maurer; Frank E Abboud; BACUS (Technical group); SPIE (Society)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2011
Language: English
LCCN: 2012359726
Series: Proceedings Of SPIE ( v. 8166 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 8166 )
Categories:
Integrated Circuits > Masks > Congresses
Masks (Electronics) > Congresses
Microlithography > Congresses

Photomask And Next-generation Lithography Mask Technology XVIII: 13-15 April 2011

ISBN: 0819486736, 9780819486738
Author/Editor(s): Toshio Konishi; SPIE (Society); Photomask Japan; BACUS (Technical group)
Publisher: SPIE ( Bellingham )
Published/Copyright Year: 2011
Language: English
LCCN: 2012360841
Series: Proceedings Of SPIE ( v. 8081 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 8081 )
Categories:
Masks (Electronics) > Congresses
Integrated Circuits > Masks > Congresses
X-ray Lithography > Congresses
Microlithography > Congresses
Optoelectronic Devices > Design And Construction > Congresses

Alternative Lithographic Technologies III: 1-3 March 2011, San Jose, California, United States

ISBN: 0819485292, 9780819485298
Author/Editor(s): Daniel J. C Herr; SPIE (Society)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2011
Language: English
LCCN: 2012360952
Series: Proceedings Of SPIE ( v. 7970 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7970 )
Categories:
Extreme Ultraviolet Lithography > Congresses
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Optical Microlithography XXIII: 23-25 February 2010, San Jose, California, United States

ISBN: 0819480541, 9780819480545
Author/Editor(s): Mircea V Dusa; Willard Conley; SPIE (Society); SEMATECH (Organization)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2010
Language: English
LCCN: 2011293385
Series: Proceedings Of SPIE ( v. 7640 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7640 )
Categories:
Integrated Circuits > Masks > Congresses
Microlithography > Congresses
X-ray Lithography > Congresses
Manufacturing Processes > Congresses

Metrology, Inspection, And Process Control For Microlithography XXIV: 22-25 February 2010, San Jose, California, United States

ISBN: 0819480525, 9780819480521
Author/Editor(s): Christopher J Raymond; SPIE (Society); Nova Measuring Instruments (Firm); SEMATECH (Organization)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2010
Language: English
LCCN: 2010459448
Series: Proceedings Of SPIE ( v. 7638 )
Categories:
Integrated Circuits > Inspection > Congresses
Integrated Circuits > Measurement > Congresses
Microlithography > Congresses
Process Control > Congresses