Alternative Lithographic Technologies III: 1-3 March 2011, San Jose, California, United States

ISBN: 0819485292, 9780819485298
Author/Editor(s): Daniel J. C Herr; SPIE (Society)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2011
Language: English
LCCN: 2012360952
Series: Proceedings Of SPIE ( v. 7970 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7970 )
Categories:
Extreme Ultraviolet Lithography > Congresses
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Alternative Lithographic Technologies II: 23-25 February 2010, San Jose, California, United States

ISBN: 0819480517, 9780819480514
Author/Editor(s): Daniel J. C Herr; SPIE (Society); SEMATECH (Organization)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2010
Language: English
LCCN: 2010459490
Series: Proceedings Of SPIE ( v. 7637 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7637 )
Categories:
Extreme Ultraviolet Lithography > Congresses
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Alternative Lithographic Technologies: 24-26 February 2009, San Jose, California, United States

ISBN: 0819475246, 9780819475244
Author/Editor(s): F. M. Schellenberg (1959-); Bruno M La Fontaine; SPIE (Society); International SEMATECH
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2009
Language: English
LCCN: 2010455661
Series: Proceedings Of SPIE ( v. 7271 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 7271 )
Categories:
Extreme Ultraviolet Lithography > Congresses
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan

ISBN: 0819473812, 9780819473813
Author/Editor(s): Alek C Chen; Burn Lin; Anthony Yen; SPIE (Society); Taiwan Semiconductor Industry Association
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2008
Language: English
LCCN: 2010287933
Series: Proceedings Of SPIE ( v. 7140 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA

ISBN: 0819471062, 9780819471062
Author/Editor(s): F. M. Schellenberg (1959-); Society of Photo-optical Instrumentation Engineers; International SEMATECH
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2008
Language: English
LCCN: 2010287918
Series: Proceedings Of SPIE ( v. 6921 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 6921 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Emerging Lithographic Technologies XI: 27 February- 1 March 2007, San Jose, California, USA

ISBN: 0819466360, 9780819466365
Author/Editor(s): Michael J Lercel (1969-); Society of Photo-optical Instrumentation Engineers; SEMATECH (Organization)
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2007
Language: English
LCCN: 2009284503
Series: Proceedings Of SPIE ( v. 6517 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 6517 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA

ISBN: 0819461946, 9780819461940
Author/Editor(s): Michael J Lercel (1969-); Society of Photo-optical Instrumentation Engineers; International SEMATECH
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 2006
Language: English
LCCN: 2007533259
Series: Proceedings Of SPIE ( v. 6151 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 6151 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses

Papers From The 44th International Conference On Electron, Ion, And Photon Beam Technology And Nanofabrication: 30 May-2 June 2000, Rancho Las Palmas, Marriott Resort, Rancho Mirage, California

ISBN: 1563969696, 9781563969690
Author/Editor(s): Ion International Conference on Electron (2000); John Melngailis; American Vacuum Society; IEEE Electron Devices Society; Optical Society of America
Publisher: Published By The American Vacuum Society Through The American Institute Of Physics ( New York )
Published/Copyright Year: 2000
Language: English
Series: Journal Of Vacuum Science & Technology ( Volume 2nd Ser., V. 18, No. 6, N/D 2000 )
Number of pages: 2865
Categories:
Photolithography > Congresses
Lithography, Electron Beam > Congresses
Ion Beam Lithography > Congresses
X-ray Lithography > Congresses
Nanotechnology > Congresses

EUV, X-ray, And Neutron Optics And Sources: 21-23 July 1999, Denver, Colorado

ISBN: 0819432539, 9780819432537
Author/Editor(s): Carolyn Ann MacDonald; Society of Photo-optical Instrumentation Engineers
Publisher: SPIE ( Bellingham, Wash., USA )
Published/Copyright Year: 1999
Language: English
LCCN: 00710730
Series: SPIE Proceedings Series ( v. 3767 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 3767 )
Number of pages: 394
Categories:
X-ray Optics > Congresses
Extreme Ultraviolet Lithography > Congresses
Lithography, Electron Beam > Congresses
Ion Beam Lithography > Congresses
Neutron Sources > Congresses

Emerging Lithographic Technologies III: 15-17 March, 1999, Santa Clara, California

ISBN: 0819431508, 9780819431509
Author/Editor(s): Yuli Vladimirsky; Society of Photo-optical Instrumentation Engineers; Semiconductor Equipment and Materials International
Publisher: SPIE ( Bellingham, Wash. )
Published/Copyright Year: 1999
Language: English
LCCN: 00268968
Series: Proceedings Of SPIE ( v. 3676 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 3676 )
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses