Emerging Lithographic Technologies X by Michael J. Lercel, Chaireditor ; Sponsored And Published By SPIE--the International Society For Optical Engineering ; Cooperating Organization, SEMATECH, Inc (USA)

Full Title: Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA
Author/Editor(s): Michael J Lercel (1969-); Society of Photo-optical Instrumentation Engineers; International SEMATECH
ISBN: 0819461946, 9780819461940
Publisher: SPIE
Published Place: Bellingham, Wash.
Published/Copyright Year: 2006
Language: English
Physical Description: Illustrations (some Colored) included, 28 cm
LCCN: 2007533259
Series: Proceedings Of SPIE ( v. 6151 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 6151 )
Number of pages: 2 v.
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses


Notes:
Includes bibliographical references and author index.

ISBNPlus ID: LOC.V35.273452-1-385921
Other ID: 69860333(OCLC)
Nature: Bibliographies
Form: Nonfiction
LC Call No: TK7874 .E527 2006
Released Date: 20070503

Download BiBTeX of this book (.bib)
@book{isbnplus9780819461940,
 title={Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA},
 author={Michael J Lercel and Society of Photo-optical Instrumentation Engineers and International SEMATECH},
 isbn={9780819461940},
 lccn={2007533259},
 series={Proceedings Of SPIE},
 url={http://isbnplus.org/9780819461940},
 year={2006},
 publisher={SPIE},
 address={Bellingham, Wash.}
}
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Download EndNote of this book (.enw)
%0 Book
%T Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA
%A Michael J Lercel
%A Society of Photo-optical Instrumentation Engineers
%A International SEMATECH
%@ 9780819461940
%U http://isbnplus.org/9780819461940
%D 2006
%I SPIE
%C Bellingham, Wash.
Download 9780819461940.enw
Download RefMan of this book (.ris)
TY  - BOOK
T1  - Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA
A1  - Michael J Lercel
A1  - Society of Photo-optical Instrumentation Engineers
A1  - International SEMATECH
SN  - 9780819461940
T3  - Proceedings Of SPIE
UR  - http://isbnplus.org/9780819461940
Y1  - 2006
PB  - SPIE
CY  - Bellingham, Wash.
ER  - 
Download 9780819461940.ris
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APA Style:
Lercel, M.J. & Society of Photo-optical Instrumentation Engineers, International SEMATECH (2006). Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash.: SPIE.

MLA Style:
Lercel, Michael J, Society of Photo-optical Instrumentation Engineers, and International SEMATECH. Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash.: SPIE, 2006. Print.

Chicago Style:
Lercel, Michael J, Society of Photo-optical Instrumentation Engineers, and International SEMATECH. Emerging Lithographic Technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash.: SPIE, 2006.