Emerging Lithographic Technologies XII by Frank M. Schellenberg, Editor ; Sponsored By SPIE ; Cooperating Organization, SEMATECH (USA)

Full Title: Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA
Author/Editor(s): F. M. Schellenberg (1959-); Society of Photo-optical Instrumentation Engineers; International SEMATECH
ISBN: 0819471062, 9780819471062
Publisher: SPIE
Published Place: Bellingham, Wash.
Published/Copyright Year: 2008
Language: English
Physical Description: Illustrations (some Colored) included, 28 cm
LCCN: 2010287918
Series: Proceedings Of SPIE ( v. 6921 )
Proceedings Of SPIE--the International Society For Optical Engineering ( v. 6921 )
Number of pages: 2 v.
Categories:
Lithography, Electron Beam > Congresses
Microlithography > Industrial Applications > Congresses
X-ray Lithography > Congresses
X-rays > Industrial Applications > Congresses
Masks (Electronics) > Congresses


Notes:
Includes bibliographical references and author index.

ISBNPlus ID: LOC.V39.330844-1-2856624
Other ID: 230253668(OCLC)
Nature: Bibliographies
Form: Nonfiction
LC Call No: TK7874 .E57 2008
Dewey Decimal: 621.3815/31
Released Date: 20110604

Download BiBTeX of this book (.bib)
@book{isbnplus9780819471062,
 title={Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA},
 author={F. M. Schellenberg and Society of Photo-optical Instrumentation Engineers and International SEMATECH},
 isbn={9780819471062},
 lccn={2010287918},
 series={Proceedings Of SPIE},
 url={http://isbnplus.org/9780819471062},
 year={2008},
 publisher={SPIE},
 address={Bellingham, Wash.}
}
Download 9780819471062.bib
Download EndNote of this book (.enw)
%0 Book
%T Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA
%A F. M. Schellenberg
%A Society of Photo-optical Instrumentation Engineers
%A International SEMATECH
%@ 9780819471062
%U http://isbnplus.org/9780819471062
%D 2008
%I SPIE
%C Bellingham, Wash.
Download 9780819471062.enw
Download RefMan of this book (.ris)
TY  - BOOK
T1  - Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA
A1  - F. M. Schellenberg
A1  - Society of Photo-optical Instrumentation Engineers
A1  - International SEMATECH
SN  - 9780819471062
T3  - Proceedings Of SPIE
UR  - http://isbnplus.org/9780819471062
Y1  - 2008
PB  - SPIE
CY  - Bellingham, Wash.
ER  - 
Download 9780819471062.ris

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APA Style:
Schellenberg, F.M. & Society of Photo-optical Instrumentation Engineers, International SEMATECH (2008). Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. Bellingham, Wash.: SPIE.

MLA Style:
Schellenberg, F. M., Society of Photo-optical Instrumentation Engineers, and International SEMATECH. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. Bellingham, Wash.: SPIE, 2008. Print.

Chicago Style:
Schellenberg, F. M., Society of Photo-optical Instrumentation Engineers, and International SEMATECH. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. Bellingham, Wash.: SPIE, 2008.